23 Apr Chemical Vapour Deposition
Chemical Vapour Deposition or CVD is the only bottom-up production method for graphene which is used in an industrial environment. Here, carbon containing gases are brought in contact with a metal surface under high temperatures (1000°C) and high pressure.
Subsequently, the graphene honeycomb structure is formed on the metal substrate which serves as a catalyst.
Even though the quality of the so produced graphene is high, being mostly SLG graphene with very little functional groups or defects, this production method has major drawbacks.
Firstly, current industrial technology is still limited in the size of the graphene surface produced. Secondly, the obtained graphene needs to be transfer from the metal surface to the target substrate.
Methods commonly used for chemical vapour deposition involve wet chemical transfer processes that can contaminate the product. Nowadays, a lot of research is still focused in improving these techniques.
Graphene obtained by chemical vapor depostion shows very good properties, it is however limited in size and versatility. Its integration into specific applications is still very challenging.